RAITH150 Two
Precision and environmental tolerance.

Since its introduction, the RAITH150 Two has established itself as a bestseller among universal, high resolution Electron Beam Lithography systems. It is used in research and nanotechnology centers worldwide and has proved its robustness in 24/7 use.

The RAITH150 Two exposes structures smaller
than 5 nm and works with sample sizes from a few mm to 8-inch wafers.

The system stability, even in difficult environments, required for demanding exposures is made possible by a thermally stabilized and environmentally tolerant shield.

Your Needs